{{Cite journal| doi = 10.1149/2.1111614jes| volume = 163| issue = 14| pages = –836-D841| last1 = Li| first1 = D.| last2 = Gao| first2 = Y.| last3 = Wang| first3 = Q.| last4 = Li| first4 = G.| last5 = Wu| first5 = C.| last6 = Daltin| first6 = A.-L.| last7 = Chopart| first7 = J.-P.| title = Tailoring the morphology, structure and magnetic properties of electrodeposited CoFe films onto Si(100) by in-situ uniform and gradient high magnetic fields| journal = Journal of the Electrochemical Society| date = 2016}}